Godin:Protocols/Lift-Off Resist: Difference between revisions
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*3 300 mL bottles | *3 300 mL bottles | ||
*[[Godin:Protocols/Sonicator]] | *[[Godin:Protocols/Sonicator]] | ||
*Tweezers | |||
'''Part 2: Pattern Photoresist''' | '''Part 2: Pattern Photoresist''' | ||
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*[http://en.wikipedia.org/wiki/Tetramethylammonium_hydroxide TMAH] | *[http://en.wikipedia.org/wiki/Tetramethylammonium_hydroxide TMAH] | ||
*[http://en.wikipedia.org/wiki/Toluene Toluene] | *[http://en.wikipedia.org/wiki/Toluene Toluene] | ||
*[http://en.wikipedia.org/wiki/Acetone Acetone] | |||
*Spill | *[http://en.wikipedia.org/wiki/Ethanol Ethanol] | ||
*Distilled water | |||
*Shipley S1813 Photoresist | |||
*2 Hot plates | |||
*Magnetic stirrer, 2 cm | |||
*Aluminum foil | |||
*Scotch Tape | |||
*300 mL Beaker | |||
*Glass dish | |||
*Spill tray | |||
*1 ml pipette and rubber bulb | |||
*Precision pipette for >= 1 mL | |||
*Positive photomask | |||
*[[Godin:Protocols/Spin coater]] | |||
*[[Godin:Protocols/Mask aligner]] | |||
'''Part 3: Deposit Metallic Film''' | '''Part 3: Deposit Metallic Film''' |
Revision as of 08:43, 20 April 2011
Safety
MaterialsPart 1: Microscope Slide Preparation
Part 2: Pattern Photoresist
Part 3: Deposit Metallic Film Part 4: Remove Resist
DescriptionPiranha is a powerful mix of sulfuric acid and hydrogen peroxide, used to clean microfluidic channels and render surfaces highly hydrophilic. Since it acts as an oxidizer, it is particularly useful against organics. The idea is to mix 1 part hydrogen peroxide into 3 parts sulphuric acid. For microfluidic cleansing, you'll only require a small amount (about 4ml). Don't make any more then you need! Preparation
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