Godin:Protocols/Lift-Off Resist

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Safety Safety goggles Nitrile gloves Lab coat Fume hood Materials Part 1: Microscope Slide Cleaning 8 microscope slides Acetone Isopropanol Ethanol Microscope slide holder 3 300 mL bottles Godin:Protocols/Sonicator Tweezers Part 2: Pattern Photoresist TMAH Toluene Acetone Ethanol Distilled water in small dish Shipley S1813 Photoresist 2 hot plates Magnetic stirrer, 2 cm Aluminum foil Scotch tape 300 mL beaker Glass dish Spill tray 1 ml pipette and rubber bulb Precision pipette for >= 1 mL Positive photomask Godin:Protocols/Spin coater Godin:Protocols/Mask aligner Part 3: Deposit Metallic Film Thermal deposition system Part 4: Remove Resist Etching solution in 300 mL beaker Spill dish Description Lift-off is a technique used to pattern metallic films using photolithography. In this procedure, Shipley S1813 photoresist is used in conjunction with toluene to create micro-sized features on glass slides. A positive mask is used, so as to expose the glass where electrodes are to be placed. Silver is then deposited, followed by an etching step to lift-off the surrounding photoresist. The silver is then electrochemically altered to form silver chloride electrodes. Part 1: Microscope Slide Cleaning Cleaning the microscope slides is an essential first step to the lift-off process. Start by inserting 8 microscope slides in the microscope slide holder, and filling it with Acetone. Acetone Isopropanol Ethanol Microscope slide holder 3 300 mL bottles Godin:Protocols/Sonicator Tweezers