Godin:Protocols/Lift-Off Resist

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Safety Safety goggles Nitrile gloves Lab coat Fume hood Materials Part 1: Microscope Slide Cleaning 8 microscope slides Acetone Isopropanol Ethanol Microscope slide holder 3 300 mL bottles Godin:Protocols/Sonicator Tweezers Part 2: Pattern Photoresist TMAH Toluene Acetone Ethanol Distilled water in small dish Shipley S1813 Photoresist 2 hot plates Magnetic stirrer, 2 cm Aluminum foil Scotch tape 300 mL beaker Glass dish Spill tray 1 ml pipette and rubber bulb Precision pipette for >= 1 mL Positive photomask Godin:Protocols/Spin coater Godin:Protocols/Mask aligner Part 3: Deposit Metallic Film Thermal deposition system Part 4: Remove Resist Etching solution in 300 mL beaker Spill dish Description Lift-off is a technique used to pattern metallic films using photolithography. In this procedure, Shipley S1813 photoresist is used in conjunction with toluene to create micro-sized features on glass slides. A positive mask is used, so as to expose the glass where electrodes are to be placed. Silver is then deposited, followed by an etching step to lift-off the surrounding photoresist. The silver is then electrochemically altered to form silver chloride electrodes. Part 1: Microscope Slide Cleaning Cleaning the microscope slides is an essential first step to the lift-off process. Start by inserting 8 microscope slides in the microscope slide holder, and filling it with acetone. Place the slide holder in the sonicator for 5 minutes, then pour the used acetone into a 300 mL bottle for future use. Repeat this step for isopropanol and ethanol. Once complete, enter the clean room. Use the tweezers to remove each slide, and blow dry with high-purity nitrogen. Visually inspect each slide. Do not touch the ethanol with your gloves, as the latter will slowly dissolve and taint your slides. If any impurities remain, redip the slides in ethanol and dry them. If any are irreparably scratched or damaged, discard. Part 2: Pattern Photoresist