Godin:Protocols/SU-8 Master: Difference between revisions
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==Description== | ==Description== | ||
A master is used as a mold for PDMS microchannels and valves. Fabrication of an SU-8 master requires multiples steps. First the wafer is cleaned using a piranha etch. Next, in a clean room environment, SU-8 is coated and patterned using a negative photomask. The patterned wafer is then developed, and checked under a microscope. | A master is used as a mold for PDMS microchannels and valves. Fabrication of an SU-8 master requires multiples steps. First the wafer is cleaned using a piranha etch. Next, in a clean room environment, SU-8 is coated and patterned using a negative photomask. The patterned wafer is then developed, and checked under a microscope. <br> <br> | ||
==Wafer Clean== | |||
Wafer cleaning is accomplished by means of a piranha etch. [[Godin:Protocols/Piranha|Piranha]] |
Revision as of 08:48, 12 May 2011
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DescriptionA master is used as a mold for PDMS microchannels and valves. Fabrication of an SU-8 master requires multiples steps. First the wafer is cleaned using a piranha etch. Next, in a clean room environment, SU-8 is coated and patterned using a negative photomask. The patterned wafer is then developed, and checked under a microscope. Wafer CleanWafer cleaning is accomplished by means of a piranha etch. Piranha |