Koch Lab:Protocols/Photolithography: Difference between revisions
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#*->spin | #*->spin | ||
#*->ok | #*->ok | ||
#Move wafer to hot plate | |||
#*wait 15 minutes | |||
#Hook up vacuum hose to UV exposer | |||
#Turn on Nitrogen | |||
#UV exposer | |||
#*Pull white lever | |||
#*->start | |||
#*wait for 200W | |||
#*->Power | |||
#*->visual align | |||
#*Tape mask onto glass (place glass side up) | |||
#**->mask clamp | |||
#*Load wafer on tray below | |||
#**->chuck vac | |||
#Push slide in | |||
#**->mask load | |||
#**->visual align | |||
#**->wafer load | |||
#**->cont (pushes wafer against mask) | |||
#*Set time | |||
#**->manual espose | |||
#*->chuck vac | |||
#*remove wafer |
Revision as of 14:42, 3 June 2008
Legend: "->" denotes physically pushing the button on the machine with the text that appears directly after symbol.
Preheat hotplate for prebaking wafer
- ->set
- ->plate temp
- ->"desired temp"
- ->ent
Applying photo resist
- Place wafer on spin coating machine
- ->speed (input speed)
- ->accel (input acceleration)
- ->time (input time)
- ->save->back
- ->run process
- ->load recipe
- ->"file name"
- Manually center wafer by "eyeballing" it (this may take several tries)
- Turn on vacuum pump (manually)
- ->center
- Manually adjust wafer if needed (repeat previous 2 steps)
- poor photo resist
- ->spin
- ->ok
- Move wafer to hot plate
- wait 15 minutes
- Hook up vacuum hose to UV exposer
- Turn on Nitrogen
- UV exposer
- Pull white lever
- ->start
- wait for 200W
- ->Power
- ->visual align
- Tape mask onto glass (place glass side up)
- ->mask clamp
- Load wafer on tray below
- ->chuck vac
- Push slide in
- ->mask load
- ->visual align
- ->wafer load
- ->cont (pushes wafer against mask)
- Set time
- ->manual espose
- ->chuck vac
- remove wafer