Koch Lab:Protocols/Photolithography

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(New page: Legend: "->" denotes physically pushing the button on the machine with the text that appears directly after symbol. Preheat hotplate for prebaking wafer *->set *->plate temp *->"desired ...)
Line 16: Line 16:
#*->load recipe
#*->load recipe
#*->"file name"
#*->"file name"
 +
#Manually center wafer by "eyeballing" it (this may take several tries)
 +
#Turn on vacuum pump (manually)
 +
#*->center
 +
#Manually adjust wafer if needed (repeat previous 2 steps)
 +
#poor photo resist
 +
#*->spin
 +
#*->ok

Revision as of 16:29, 3 June 2008

Legend: "->" denotes physically pushing the button on the machine with the text that appears directly after symbol.

Preheat hotplate for prebaking wafer

  • ->set
  • ->plate temp
  • ->"desired temp"
  • ->ent

Applying photo resist

  1. Place wafer on spin coating machine
    • ->speed (input speed)
    • ->accel (input acceleration)
    • ->time (input time)
    • ->save->back
    • ->run process
    • ->load recipe
    • ->"file name"
  2. Manually center wafer by "eyeballing" it (this may take several tries)
  3. Turn on vacuum pump (manually)
    • ->center
  4. Manually adjust wafer if needed (repeat previous 2 steps)
  5. poor photo resist
    • ->spin
    • ->ok
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