Photolithography - Yalin Liu: Difference between revisions
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=Overview of Photolithography= | =Overview of Photolithography= | ||
Photolithography is the process of transferring patterns using light. There are four basic steps in photolithography process, spin coating, pre-exposure bake, exposure to UV through the mask and post-exposure baking. | Photolithography is the process of transferring patterns using light. Usually, the light is used to transfer a geometric pattern from a photomask to a substrate. In the process of transfer, a series of chemical treatment happened to engrave desired patter on to substrate by photo resist.There are four basic steps in photolithography process, spin coating, pre-exposure bake, exposure to UV through the mask and post-exposure baking. | ||
[[Image: | [[Image:Screen_Shot_2017-03-25_at_8.44.53_PM.png]] | ||
Revision as of 17:52, 25 March 2017
Overview of Photolithography
Photolithography is the process of transferring patterns using light. Usually, the light is used to transfer a geometric pattern from a photomask to a substrate. In the process of transfer, a series of chemical treatment happened to engrave desired patter on to substrate by photo resist.There are four basic steps in photolithography process, spin coating, pre-exposure bake, exposure to UV through the mask and post-exposure baking.
Depends on the application, it has two mechanisms.
• Positive Photoresist
• Negative Photoresist
